Electrochemical Polishing Tungsten Evaporation Materials

• Delivery Time: 7-10 Days
• Shape: Round
• Certification: TUV, ISO, CE
• Transport Package: Vacuum Wooden Box
• Specification: Customized
• Trademark: szzzyj
• Origin: China
• Production Capacity: 100 Tons / Year

Product Description

 

Product Description

99.99% Gold Au Sputtering Plate Gold Target for Thin Film Coating

Gold has a density of 19.3 g/cm3, almost identical to that of tungsten at 19.25 g/cm3; as such, tungsten has been used in counterfeiting of gold bars, such as by plating a tungsten bar with gold, or taking an existing gold bar, drilling holes, and replacing the removed gold with tungsten rods. By comparison, the density of lead is 11.34 g/cm3, and that of the densest element, osmium, is 22.588 ± 0.015 g/cm3.
 

Product Name	99.99% Gold Au Sputtering Plate Gold Target for Thin Film Coating
Purity	99.99%
Color	Gold, Lustrous.
Sputter	DC
Size	Tube/ Plate, Customized
Processing Method	Powder Metallurgy
Service	Target Bonding with Indium

Evaporation materials high purity titanium pellets 99.995 titanium granules  

Item Name	High purity Ti pellets
Purity	99.99% ,99.999%
Available size	Customization is available
Certificates	ISO9001:2008, SGS, the third test report
Impurity content	Low
Application	Widely used in coating processing industries, semiconductor and electronic  field ,glass coating and decoration.
Detailed information	Pure titanium and titanium-based alloy are new-style structural materials, mainly used for aerospace industry and marine industry.   Titanium can melt with iron, aluminum, vanadium or molybdenum and other elements, creating high-strength light alloy, which is widely used in all respects, including aerospace ( jet engines, missiles and spacecraft), military, industrial process (chemical and petroleum products, seawater desalination and papermaking), automobiles, agri-food, medicine (prostheses, orthopedic transplant and dental equipment and filler), sporting goods, jewelry and mobile phones and so on.

 

Quality Standard (99.999% Ti)
Element	Value(<ppm)	Element	Value (<ppm)	Element	Value(<ppm)
Ag	0.05	Al	0.11	As	0.03
Au	0.05	B	0.01	Ba	0.005
Be	0.005	Bi	0.01	Br	0.05
Ca	0.2	Cd	0.05	Ce	0.005
Hg	0.1	Fe	3.2	Ga	0.05
I	0.01	Ge	0.05	Hf	0.01
In	0.05	Ir	0.01	K	0.01
La	0.005	Li	0.01	Pt	0.05
Mg	0.06	Mn	0.06	Mo	0.5
Na	0.01	Nb	0.2	Nd	0.005
Ni	0.24	Os	0.01	P	0.01
Pb	0.01	Pd	0.01	Re	0.01
Rh	0.05	Ru	<0.01	Sb	0.05
Sc	0.05	Se	<0.05	Sm	0.005
Sn	0.05	W	<0.01	Ta	5
V	0.02	Te	<0.05	Th	0.0001
Dy	0.005	Er	<0.005	F	0.05
Zr	0.05	S	0.02	Si	0.24
Cr	0.06	Co	<0.01	Zn	0.05
Cu	0.28	Cl	0.23	Cs	0.01

 

The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material