| Application: | PVD Coating |
|---|---|
| Standard: | ASTM |
| Purity: | >99.95% |
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| Product Name | tungsten crucible |
| Material Composition | Tungsten |
| Purity | 99.95% |
| Density | ≥17.8g/cm3 |
| Using temperature | Within 2000°C |
| Highest temperature | 2400°C |
| Tolerance | ±0.5mm |
| Smooth degree | Ra≤3.2 |
| Appearance | Silver gray metallic luster |
| Product Name | Tungsten Target W Disc Tungsten Sputtering Target for Coating |
| Sputter | DC |
| Size | Tube/ Plate, Customized |
| Processing Method | Powder Metallurgy |
| Service | Target Bonding with Indium |
(1) Sintering tungsten crucible:
Density: 18.0~18.5g/cm3
Working Temperature: 1800~2600DC
(2) Forging Tungsten Crucible:
Density: 18.5~19.0g/cm3
Woring Temperature: 1800~2600DC
| Description | Purity | Density | HardnessHV(reference) | Dimension |
| W crucible | ≥99.95 | ≥17.8g/cm3 | ≥200 | accordig drawing |
| Product Name | Tungsten Target W Disc Tungsten Sputtering Target for Coating |
| Sputter | DC |
| Size | Tube/ Plate, Customized |
| Processing Method | Powder Metallurgy |
| Service | Target Bonding with Indium |
Disc target:
Diameter: 10mm to 360mm
Thickness: 1mm to 10mm
Planar target:
Width: 20mm to 600mm
Length: 20mm to 2000mm
Thickness: 1mm to 10mm
Rotary target:
Outer diameter: 20mm to 400mm
Wall thickness: 1mm to 30mm
Length: 100mm to 3000mm
Tungsten materials have the characteristics such as high temperature resistance, low pollution, is widely used in sapphire crystal furnace thermal field components, including the crucible, crucible lid, heating element, heat insulation screen, support rods, base, etc.
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