Competitive Price Customized Polished Surface 99.95% High Purity Niv7 Nickel

Product Details
Transport Package: Wooden Box Vacuum
Specification: Drawing customization
Origin: China
Gold Member Since 2018

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Plant Area
101~500 square meters
Management System Certification
ISO 9001, ISO 14001, QHSE
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Basic Info.

Production Capacity
20 Tons / Year

Product Description

Product Description

1. Name: Sputtering 99.9% V Target Vanadium Metal Target
2. Size: 3", as request
3. Purity: 99.9% 
4. Certification: ISO9001, SGS, CTI, ROHS

Product NameSputtering 99.9%NiV Target Vanadium Metal Target
MaterialVanadium
ColorSilver gray
SizeAs request
Purity99.9%
KeywordVanadium
TechnicsForging machining
UsedThin film coating

 

Other Related Products:

 

METAL SPUTTERING TARGETS
ProductElementPurityShape
Vanadium sputtering targetV3Nplanar targets, rotary target
Iron sputtering targetFe3N, 3N5, 4Nplanar targets, rotary target
Cobalt sputtering targetCo3N5planar targets
Silver sputtering targetAg4Nplanar targets
Molybdenum sputtering targetMo3N5planar targets, rotary target
NiobiumNb3N5planar targets, rotary target 
TantalumTa3N5, 4Nplanar targets, rotary target 
TungstenW3N5planar targets, rotary target 
NickelNi3N, 3N6, 4N, 4N5, 5Nplanar targets, rotary target 
TitaniumTi2N7, 4N, 4N5, 5Nplanar targets, rotary target 
AluminiumAl3N5, 4N, 4N6, 5N, 6Nplanar targets, rotary target
ChromiumCr2N5,3N5planar targets
CopperCu4N, 5N, 6Nplanar targets, rotary target
GoldAu4N-5Ncustomized
BoronB2N-6Ncustomized
BismuthBi4N-5Ncustomized
CalciumCa3Ncustomized
CeriumCe3N-4Ncustomized
DysprosiumDy3N-4Ncustomized
EuropiumEu3N-4Ncustomized
GalliumGa5N-7Ncustomized
GermaniumGe5Ncustomized
HolmiumHo2N5-3Ncustomized
LithiumLi3Ncustomized
MagnesiumMg3N5-4Ncustomized
NeodymiumNd2N5-3N5customized
AntimonySb3N5-5Ncustomized
StrontiumSr3Ncustomized
TerbiumTb3N5customized
YttriumY3N5customized
ZincZn3N5-5Ncustomized
BerylliumBe2N-3Ncustomized
ErbiumEr3N-4Ncustomized
GadoliniumGd3N-4Ncustomized
HafniumHf3N-4Ncustomized
IndiumIn4N-5Ncustomized
LanthanumLa3N-4Ncustomized
LutetiumLu3N-4Ncustomized
ManganeseMn3N-4Ncustomized
LeadPb4Ncustomized
PraseodymiumPr2N5-3Ncustomized
RheniumRe3N5customized
TinSn3N5-5Ncustomized
ThuliumTm2N5-3N5customized
YtterbiumYb3N5customized
ZirconiumZr2N5-3N5customized
ScandiumSc3N5customized
 
METAL ALLOY SPUTTERING TARGETS
ProductElementPurityShape
Nickel vanadium alloy sputtering targetNi + V3N, 3N6, 4Nplanar targets, rotary target
Nickel iron alloy sputtering targetNi + Fe3N5, 4Nplanar targets
Nickel chromium alloy sputtering targetNi + Cr3N, 3N6, 4Nplanar targets, rotary target
Iron cobalt alloy sputtering targetFe + Co3N, 3N6, 4Nplanar targets, rotary target
Iron cobalt tantalum zirconium alloy sputtering targetFe + Co + Ta + Zr3N5planar targets
Cobalt tantalum zirconium alloy sputtering targetCo + Ta + Zr3N, 3N5planar targets
Copper gallium alloy sputtering targetCu + Ga4N, 5Nplanar targets, rotary target
Copper indium alloy sputtering targetCu + In4N, 5Nplanar targets, rotary target
Copper indium gallium alloy sputtering targetCu + In +Ga4N, 5Nplanar targets, rotary target
Titanium Alumnum alloy sputtering targetTi + Al2N8planar targets







 

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