China Planar Magnetic Sputtering Coating Target Cr Chromium Target for Sale

Product Details
Type: Metal Target
Certification: TUV, ISO, CE
The Date of Delivery: 10days
Manufacturer/Factory, Trading Company
Gold Member Since 2018

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Plant Area
101~500 square meters
Management System Certification
ISO 9001, ISO 14001, QHSE
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Basic Info.

Model NO.
1
Transport Package
Vacuum Packed in Wooden Case
Specification
customization
Origin
China
Production Capacity
500 Tons

Product Description

Product Description
1. Name : HIP rolled Pure Chromium sputtering target for coating film
2. Size: Arc / Rectangle /planar with hole or step as customized
3. Bonding on copper backing plate as drawing

4. Application: Decorative Coating Industry, Large Area Glass Coating, Tribological coating
5. Certification: ISO9001, SGS, CTI, ROHS
Product Name
CHIP rolled Pure Chromium sputtering target for coating film
Material
Pure Chromium
Color
Metal
Standard
High Purity, Above 99.95%
Size
Tube/ Plate, Customized
Keyword
Pure Chromium
Technics
Hot Isostatic Pressing, Powder metallurgy
Used
Decorative Coating Industry
Products Show

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.

Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
 

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