Guangdong, China
Business Type:
Manufacturer/Factory
Plant Area:
101~500 square meters
Management System Certification:
ISO 9001, ISO 14001, QHSE
Main Markets:
North America, Eastern Europe, Southeast Asia, Western Europe
Average Lead Time:
Peak season lead time: 6-12 months
Off season lead time: one month
Sample Available

Aluminum Target, High Purity Aluminium, Aluminium manufacturer / supplier in China, offering Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating, PVD Coating Materials Chromium Cathode Arc Target Chromium Target, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum and so on.

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Supplier Homepage Products Metal Sputtering targets Aluminum(Al) target Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
  • Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
  • Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
  • Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
  • Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
  • Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
  • Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating

Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating

Get Latest Price
Purchase Qty. / Reference FOB Price
1-9 Pieces US $10
10+ Pieces US $9
Port: Hong Kong, Hong Kong
Transport Package: Vacuum Wooden Box
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram
Type: Window & Door Aluminium Profile, Decoration Aluminium Profile, Heat Sink Aluminium Profile, Glass Wall Aluminium Profile, Transport Aluminium Profile, Industrial Aluminium Profile
Shape: Drawing Customization
Grade: High Purity ,1050,1060,1070
Temper: T3-T8
Window & Door Aluminium Profile: 90 Series
Alloy: Non-alloy

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Basic Info

Model NO.
2
Surface Finishing
Polished
Alloying Ingredient
99.999%
Certification
CE, SONCAP, ISO, CIQ, RoHS
Polished Aluminum Profile
Mechanical Polishing
Specification
Drawing customization
Origin
China

1050 1060 1070 pure light weight plastic aluminum sheet

         

Product Type

Aluminium plate,Aluminium sheet,

Aluminum  circle,Aluminium coil, Aluminium strip.etc

Product Martial1xxx series,3xxx series,5xxx series, 6xxx series,8xxx series
Hardness stateHO,H14, H16, H18, H24,H22.etc
Product SizeThickness:0.1mm-10mm, 100mm<width<2000mm,
Length :2000mm - 8000mm
Also accept customized
Surface TreatmentMill finished
Processed

Aluminium 5 bar, embossed plate, 

aluminium per-printed coil, aluminium tile,etc

Min order quantity5 tons
Short lead time15-30 days
Application

Architectural/Decoration,Household,

Transformer,Appliance,Transportatio, etc

Month Capacity5000 tons
Accepted Payment TypeT/T
Port of LoadingShanghai
PackingExport wooden pallets.  Customer's requests.
Oversea Market

South America, Southeast Asia, Africa,Oceania,

 Mid East

Ratio of Domestic/Export70%,30%
Our advantage

Manufacture near from Shanghai reasonable price

, various product, ensure quality

Aluminum Plate/Sheet/Coil/Circle
1.Material:1000 series: 1050,1060,1070,1090,1100.etc
2000 series: 2014,2015,2024.etc
3000 series: 3003,3004,3005,3014,3015.etc
5000 series: 5052,5083,5252,5754,5a06.etc
6000 series: 6080,6061,6063.etc
7000 series: 7022,7075
8000 series: 8011.etc
2.Thickness:  0.1mm-10mm
3.Width:   1000-2000mm
4.Length:2000-6000mm or as your requirements
5.Temper:O,H14,H18,H24,H112,T6,T5,T4,T8
High Purity aluminium sputtering target
1. Processing technology: vacuum smelting
2. Alloy uniform gold degree:  high
3. The density: high

4. Purity: ≥ 99.99-99.999%
5. Usages: High purity alloys has been widely applied in the decoration profession, PVD,aerospace, anti-corrosion layer, antifriction tool membrane, integrated circuit, display, solar battery, optical components, magnetic storage, etc.  
6. Specific dimension and the alloy component can be supplied as per customer's requirements.
7. Size and quality is according to customer's request.
Advantage:
1.High quality and competitive price.
2.Timely delivery.
If any item you need,or any suggestion you have,please contact us.
Your sincere inquiries are typically answered within 24 hours.

Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
 The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating


Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating
Al Target Aluminum Sputtering Target for Depositing 99.999% Thin Film PVD CVD Coating

 The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
 

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