High Purity Chromium Sputtering Target, Cr Sputtering Targets for PVD Coating Machine

• Type: Metal Target
• Certification: TUV, ISO, CE
• The Date of Delivery: 10days
• Transport Package: Vacuum Packed in Wooden Case
• Specification: customization
• Origin: China
• Production Capacity: 500 Tons

Product Description

Product Description

1. Name : HIP rolled Pure Chromium sputtering target for coating film
2. Size: Arc / Rectangle /planar with hole or step as customized
3. Bonding on copper backing plate as drawing

4. Application: Decorative Coating Industry, Large Area Glass Coating, Tribological coating
5. Certification: ISO9001, SGS, CTI, ROHS

Product Name	CHIP rolled Pure Chromium sputtering target for coating film
Material	Pure Chromium
Color	Metal
Standard	High Purity, Above 99.95%
Size	Tube/ Plate, Customized
Keyword	Pure Chromium
Technics	Hot Isostatic Pressing, Powder metallurgy
Used	Decorative Coating Industry

Products Show

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material