Made in China Silicon Sputter Target Use for Stn/Tn/TFT-LCD Optical Glass, Ion Plating, etc

• Warranty: Coating
• Number of Cells: for Coating
• Application: Agriculture
• Model NO.: Si
• Condition: New
• Certification: ISO
• Material: Polycrystalline Silicon
• Delivery Time: 7 Days
• Type: P Type
• Transport Package: Wooden Box, Vacuum Package
• Specification: according the drawing
• Trademark: szzzyj
• Origin: China
• Production Capacity: 50 Tons / Year

Product Description

Product Description

Top quality Si sputtering target Silicon target,can be different size or length



We offer a wide range of ceramic and metallic sputter targets,in planar and rotatable shape,a complete range of targets.
Our rotatable sputter targets are available in lengths up to 4M.Any shorter tube is available.
We are able to produce dog-bone and straight targets,depending on the material and production method requested.

Application,widely used in conductive glass,STN/TN/TFT-LCD,Optical glass,ion plating,etc...Applicable to all planar coating and rotary coating system

Technical Parameter

Material Type	Silicon	Symbol	Si
Composition	Si	Purity	>99.9%
Color/Apperance	Gray	Density	>2.2g/cm3(>95%)
Molding process	HPS	Resisitivity(20ºC)	<20ohm.cm
Maximum Impurities	Fe:150 Ca:26 Cr:30	Cu:50 Al:500 Ni:30	N: 300 Mn:20 O:6000

1.Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
 
2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material


2.Our Sputtering Target Products :

Materials	Type	Product	Shape
ceramic	Si	silicon sputtering target	rotarable
	NbOx	Niobium Oxide sputtering target	rotarable
	TiOx	Titanium Oxide sputtering target	rotarable
	AZO	Alumina doped zinc oxide sputtering target	rotarable/ planar
	ITO	Indium Tin Oxide sputtering target	rotarable
metal	Mo	Molybdenum sputtering target	rotarable/ planar
	Cr	Cr Rotary Sputtering target	rotarable
	Sn	Stannum sputterig target	rotarable
alloy	SiAl	SiAl sputtering target	rotarable
	NiCr	Nickle chromium sputtering target	rotarable/ planar
	ZnSn	Zinc Stannum sputtering target	rotarable
	ZnAl	Zinc Aluminum sputtering target	rotarable
	CuInGa	CuInGa sputtering target	rotarable