Guangdong, China
Business Type:
Manufacturer/Factory
Plant Area:
101~500 square meters
Management System Certification:
ISO 9001, ISO 14001, QHSE
Main Markets:
North America, Eastern Europe, Southeast Asia, Western Europe
Average Lead Time:
Peak season lead time: 6-12 months
Off season lead time: one month
Sample Available

Indium, Indium Ingot, Indium Sputtering Target manufacturer / supplier in China, offering 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum, 4n Pure Ta Tantalum Sputtering Target and so on.

Gold Member Since 2018
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Supplier Homepage Products Metal Sputtering targets Indium & Tin target 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
  • 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
  • 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
  • 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
  • 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
  • 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
  • 99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target

99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target

Get Latest Price
Min. Order: 1 Piece
Port: Hong Kong, Hong Kong
Production Capacity: 1000 Tons / Year
Payment Terms: T/T
Application: Aviation, Electronics, Industrial, Medical, PVD Ncvm
Standard: JIS, DIN, BS, ASTM
Purity: >99.99%
Grade: 6N (99.9999%)
Alloy: Non-alloy
Transport Package: Vacuum Packing

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Basic Info

Model NO.
high quality indium
Specification
Wafers, wires, ingots, rotary casting, pipes, gran
Origin
China
Indium ingot  99.995% 4N5
Indium ingot: Standard: YS/T257-1998 
Indium metal Assay method: ICP analysis purity
Appearance: indium ingot is silvery white lump, which is soft.
Molecular Weight: 114.82, 
Density: 7.31g/cm3
Melting Point:156.61°C
Resistivity: 8.37 mΩ cm
Melting Point: 156.61celsius degree
Boilint Pont: 2060celsius degree
Solubility: indium ingot is soluble in dense sulfuric acid,
nitric acid, insoluble in water. powder would fire when come to
fire.
Package:0.5kg/Ingot,20~25kg/case
Application: Indium ingot is mainly used in ITO film NCVM, 
solder in electronic industry, sealing 
element in low temperature and 
vacuum area, solubility anode 
and nuclear reactor control bar.Indium ingot is a kind of dopant
for semiconductor.

Analysis Example(Unit:ppm)   

In

Cu

Ag

Mg

Ni

Zn

Fe

Cd

As

Si

Al

Tl

Pb

S

Sn

5N

0.4

0.5

0.5

0.5

0.5

0.5

0.5

0.5

1.0

0.5

1.0

1.0

1.0

1.5

 

Basic information for  indium wire  99.999% 

1.Purity:99.999% indium wire CAS 7440-74-6 with factory price

2.MOQ:1kg;

3.Main application:  Primarily used in fusible alloys, solders and flat panel display coatings

4.Diameter: 1.5mm,1mm,0.5mm,0.2mm,0.3mm,etc.

99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target

99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target

The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
 

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99.995% 99.999% High Quality Indium Ingot, Indium Sputtering Target
 

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