High Purity Silver Sputtering Target, AG Sputtering Targets

• Type: PVD
• Shape: Round
• Certification: TUV, ISO, CE
• Model NO.: wire
• Delivery Time: 7-10 Days
• Transport Package: Vacuum Wooden Box
• Specification: Customized
• Trademark: szzzyj
• Origin: China
• Production Capacity: 100 Tons / Year

Product Description

Thin film coating materials 99.99% sliver/Ag sputtering target
We produce a wide range of high purity Metal sputtering target - with purities of up to 99.9999%, and dimension exactly according to your drawing. Silver/Ag sputtering target, Once we get your inquire with full details on the material, purity, dimensions, any special tolerances and the quantity required, our sales engineer will contact with you immediately.
 

Product Name	sliver/Ag sputtering target
Available Purity(%)	99.99(4N),99.999(5N)
Shape	Round
Size	as your request
Melting point(ºC)	962
Density(g/cm³)	10.5
Boiling point(ºC)	2163
Technology	Vacuum Melting, Patented thermo-mechanical process and machine work
Application	Solar Photovoltaic,.Electronic and Semiconductor ,Decoration and Coating.etc.

 

The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material