Guangdong, China
Business Type:
Manufacturer/Factory
Plant Area:
101~500 square meters
Management System Certification:
ISO 9001, ISO 14001, QHSE
Main Markets:
North America, Eastern Europe, Southeast Asia, Western Europe
Average Lead Time:
Peak season lead time: 6-12 months
Off season lead time: one month
Sample Available

Titanium Aluminum Alloy Targets, Tial Alloy Target, Titanium Aluminum manufacturer / supplier in China, offering Titanium Aluminum Alloy Tial Sputtering Target 50: 50at%, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum, 4n Pure Ta Tantalum Sputtering Target and so on.

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Supplier Homepage Products Alloy targets TiAl alloy target Titanium Aluminum Alloy Tial Sputtering Target 50: 50at%

Titanium Aluminum Alloy Tial Sputtering Target 50: 50at%

Get Latest Price
Min. Order: 1 Piece
Port: Hong Kong, Hong Kong
Production Capacity: 20 Tons / Year
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram
Type: Cylinder,Plane
Application: Industrial, Medical, Surface Treatment
Technique: Hip
Grade: High Purity
Shape: Drawing Customization
Composition: 50:50at%,67:33at%,88:12at%,80:20 at%,or as Your Re

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Basic Info

Model NO.
tial alloy
Transport Package
Wooden Box Vacuum
Specification
Drawing customization
Origin
China

Product Description

Titanium Aluminum Alloy pvd Targets/Titanium Sputtering Targets/TiAl alloy target for coating

 TiAl alloy target Proportion:
TI/Al=80:20,70:30,67:33,50:50at%andwt%
Al/Ti=80:20,70:30,67:33,50:50at%andwt%
Molding industry: thermal isostatic pressure (HIP)

Grade: TA1/Gr1,TA2/Gr2, TA3/GR3,TC4/Gr5 

Standard : ASTM B 381,GB/T 3620.1, GB/T 3620.2, GB/T 15073

Size: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T)

Or can be customized

Surface: bright

Titanium Aluminum is silver-white metal with similar appearance to steel. Widely used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
 
Product Name
Titanium Aluminum (TiAl) Sputtering Target
Purity
99.99%
Color
Grayish White, Lustrous, Metallic
Sputter
DC
Size
Tube/ Plate, Customized
Processing Method
Smelting and casting
Package
Vacuum coating
Service
Target Bonding with Indium

Chemical requirements

 

N

C

H

Fe

O

Al

V

Pa

Mo

Ni

Ti

Gr 1

0.03

0.08

0.015

0.20

0.18

/

/

/

/

/

bal

Gr 2

0.03

0.08

0.015

0.30

0.25

/

/

/

/

/

bal

Gr 3

0.05

0.08

0.015

0.30

0.35

/

/

/

/

/

bal

Gr 4

0.05

0.08

0.015

0.50

0.40

/

/

/

/

/

 

Gr 5

0.05

0.08

0.015

0.40

0.20

5.5~6.75

3.5~4.5

/

/

/

bal

Gr 7

0.03

0.08

0.015

0.30

0.25

/

/

0.12~0.25

/

/

bal

Gr 9

0.03

0.08

0.015

0.25

0.15

2.5~3.5

2.0~3.0

/

/

/

bal

Gr12

0.03

0.08

0.015

0.30

0.25

/

/

/

0.2~0.4

0.6~0.9

bal

Titanium Aluminum Alloy Tial Sputtering Target 50: 50at%
Titanium Aluminum Alloy Tial Sputtering Target 50: 50at%
Titanium Aluminum Alloy Tial Sputtering Target 50: 50at%



 

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