Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu, ITO, Azo. Tzo, Wc, Nb2o5, TiO2, Sio2 Target

• Application: PVD, Vacuum Coating
• Batch Number: 2010+
• Manufacturing Technology: Hip, Sintering, Casting
• Model NO.: Metal target, alloy target
• Material: Metal Target, Alloy Target, Ceramic Target
• Model: Drawing Customization
• Package: Vacuum Wooden Box
• Signal Processing: Simulation
• Delivery Time: 7 Days
• Type: Cylinder, Plane
• Brand: Szzzyj
• Transport Package: Wooden Box Vacuum
• Specification: Drawing customization
• Trademark: szzyj
• Origin: China
• Production Capacity: 50 Tons / Year

Product Description

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
 
2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material