Guangdong, China
Business Type:
Plant Area:
101~500 square meters
Management System Certification:
ISO 9001, ISO 14001, QHSE
Main Markets:
North America, Eastern Europe, Southeast Asia, Western Europe
Average Lead Time:
Peak season lead time: 6-12 months
Off season lead time: one month
Sample Available

Alcr Alloy Target, Cral Alloy Target, Chromium Aluminum Alloy manufacturer / supplier in China, offering Metal Alloy Chromium Aluminum Cral Alloy Sputtering Target, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum, 4n Pure Ta Tantalum Sputtering Target and so on.

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Supplier Homepage Products Alloy targets CrAl alloy target Metal Alloy Chromium Aluminum Cral Alloy Sputtering Target

Metal Alloy Chromium Aluminum Cral Alloy Sputtering Target

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Min. Order: 1 Piece
Port: Hong Kong, Hong Kong
Production Capacity: 10 Tons / Year
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram
Product Type: PVD
Material: Alcr Alloy
ET: 0.01mm
Hole: Drawing Customization
Molding Process: Hip
Transport Package: Wooden Box Vacuum

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Basic Info

Model NO.
alar alloy
Drawing customization

Our Product Description

AlCr alloy Sputtering Target Of High Quality

Item NameAlCr alloy Sputtering Target
Molding processHIP
CertificateISO9001:2008, SGS, The third test report
GradeIndustrial Grade
UsageThin Film Coating
ApplicationPVD Process

Metal Alloy Chromium Aluminum Cral Alloy Sputtering Target

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material

Metal Alloy Chromium Aluminum Cral Alloy Sputtering Target

Metal Alloy Chromium Aluminum Cral Alloy Sputtering Target

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