99.999% Hige Purity Silicon Target, Sprayed Sial Alloy Target

• Type: Cylinder, Plane
• Manufacturing Technology: Discrete Device
• Material: High Purity Silicon
• Model NO.: Silicon ingot, rod, piece, tube, ring
• Transport Package: Wooden Box Vacuum
• Production Capacity: 50 Tons / Year

Product Description

1.Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
 
2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material


2.Our Sputtering Target Products :

Materials	Type	Product	Shape
ceramic	Si	silicon sputtering target	rotarable
	NbOx	Niobium Oxide sputtering target	rotarable
	TiOx	Titanium Oxide sputtering target	rotarable
	AZO	Alumina doped zinc oxide sputtering target	rotarable/ planar
	ITO	Indium Tin Oxide sputtering target	rotarable
metal	Mo	Molybdenum sputtering target	rotarable/ planar
	Cr	Cr Rotary Sputtering target	rotarable
	Sn	Stannum sputterig target	rotarable
alloy	SiAl	SiAl sputtering target	rotarable
	NiCr	Nickle chromium sputtering target	rotarable/ planar
	ZnSn	Zinc Stannum sputtering target	rotarable
	ZnAl	Zinc Aluminum sputtering target	rotarable
	CuInGa	CuInGa sputtering target	rotarable