Large Size 99.99% ITO Target Indium Tin Oxide Rotating Target and Bonding

• Type: Ceramic Target
• Shape: Film, Ring, Tube, Round, Granule and Blueprint Cus
• Certification: TUV, ISO, CE
• Model NO.: ITO 90: 10 wt%
• Transport Package: Vacuum Wooden Box
• Specification: Drawing customization
• Origin: China
• Production Capacity: 50000 Pieces/Year

Product Description

Physical Properties

Product Description

1. Name: 99.99% ITO Sputtering Target Indium Tin Oxide for Thin Film Coating
2. Size: 1-8inch, as request
3. Purity: 99.99% 
4. Certification: ISO9001, SGS, CTI, ROHS

Product Name	99.99% ITO Sputtering Target Indium Tin Oxide for Thin Film Coating
Material	Indium Tin Oxide
Color	Black
Size	1-8inch as request
Purity	99.99%
Keyword	Indium Tin Oxide
Technics	Forging machining
Used	Thin film coating

Characteristic  
 
1. Indium tin oxide (ITO, or tin-doped indium oxide) is a solid solution of indium (III) oxide (In2O3) and
    tin (IV) oxide (SnO2), typically 90% In2O3, 10% SnO2 by weight.
2. Indium tin oxide is one of the most widely used transparent conducting oxides. 
3. Its two chief properties: its electrical conductivity and optical transparency, as well as the ease with
    which it can be deposited as a thin film.

Our products have passed the customers' certification from United States, Sweden, Germany, France, 
Taiwan and domestic market.
Product Description
Yeke is committed to providing customers with stable performance and high quality ITO target,by using 4N5 indium ingot and coprecipitation to produce ITO nano powder.According to the requirements of the users, composition of tolerance control at + / - 0.5 wt %, and dimensional tolerance control at + / - 0.1 mm, thickness ranges from 3 mm to 14 mm.
Composition:In2O3/SnO2= 90/10;97/3 ; 95/5
Performance parameter:
Density:>99.5%
Purity:>99.99%
Resistivity:≤1.8×10-4Ω·cm
Size of single piece: 600x500mm
Products attributes of ceramic target

Item Name	ITO Sputtering target Ceramic Target for Thin Film Coating
Shape	Square/Round, according to your request
Available size	Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available
Certificates	ISO9001:2008,SGS,the third test report
Technics	Powder metallurgy
Application	Widely used in coating processing industries such as solar photovoltaic application, optics, photonics, electronics, solar cells, decoration and other kind   ZhongNuo supply those material used in sputtering target,Thin film coating, IC, PVD coating, Optical thin film, Optical Communication    Ceramic (Oxide, Carbide, Nitride, Boride, Antimonide, Silicide, Fluoride, Selenide, Sulfide, Telluride) sputtering target.    Ceramics, Thin film coating, Optical thin film, Electric thin film, PVD thin film, Superconducting thin film, Protective thin film, surface thin film, IC coating, Vacuum evaporation coating, color coating, Optical Communication, Enameling, Display industry    Most of those material can be offered in powder, lump, pellet, rod, sheet, tablets, discs, plate, tube made from hot press or cold press or vacuum sinter.     Purity: 99% to 99.999%    We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to answer for you ASAP.    Oxide: Al2O3, Al2O3-Ge, Al2O3-ZnO, AZO, Al-ZnO, Al2O3-ZrB2, Sb2O3, Sb2O3-SnO2, ATO, Bi2O3,CaO, CeO2, CeO2-ZrO2, Cr2O3, CuO, Cu2O, CuAlO2, CuO-ZnO, CoO,Dy2O3, Eu2O3, Er2O3, Gd2O3, GeO2, Ga2O3, Ga2O3-ZnO, Ho2O3, HfO2, HfO2-Y2O3, HfO2-CaO, FeO, Fe3O4, Fe2O3, In2O3, In2O3-SnO2, ITO, In2O3-V, La2O3, Lu2O3, MgO, MnO2-CoO, MoO3, Nb2Ox, Nb2O5-TiO2, NiO, VO2, V2O5, Pr6O11, PbTiO3, PbZrO3, SiO, SiO2, SiO2-ZnS, PbZrTiO3, Sm2O3, SnO2, Sc2O3, TiO, Ti2O3, TiO2, Ti3O5, Ta2O5, Tb4O7, Tm2O3, WO3, WO3-Li2O, Y2O3, Yb2O3, ZrO2, ZnO.     Intermetallic compounds: Al-ZnO, Al-ZnS, Al-ZrB2, AG-WS2, B-SiO, BaF2, Cu-ZnS, Cr-SiO, Ge-Al2O3, Li-WO3, Mn-ZnS, Mn-ZnO, MgF2, Pb-PbTiO3, SiO2-ZnS, Sn2ZnO5, Ta-Er2O3, V-In2O3, SiO-Ge    Other compounds: SnO2-Al2O3, CdSnO2, ZnO-In2O3, ZnO-MgO, Sn2ZnO5, Sc2O3-ZrO2-NiO, Y2O3-ZrO2-Ni, ZrO2-Y2O3, YSZ, YBCO, Gd2Zr2O7, In2O3-Ga2O3-ZnO, IZGO, In2O3-Ga2O3, IGO, In2O3-GeO2, In2O3-TiO2, LaAlO3, La2ZrO7, La2O3-Sm2O3, La2O3-Er2O3, La2O3-TM2O3, LiNbO3, LiTaO3, LiPO4, LiCoO2, Ta2O5-Er2O3, Ta2O5-In2O3-ZnO,BaSrTiO3, BaTiO3, PbTiO3, SrTiO3     Sulfide: ZnS, Pb2S, PbS, WS2, MoS2, FeS. Ce2S3, CdS    Silicides: ReSi2, CoSi2, CrSi2, Cr3Si, HfSi2, FeSi2, MoSi2, MoSi2-WSi2, NbSi2, VSi2, V3Si, NiSi2, Ta5Si2, TaSi2, Ta3Si5, Ti5Si3, TiSi2, Ti3SiC2, WSi2, ZrSi2.    Nitride: AlN, BN, CrN, CuN, Si3N4, TiN, TaN, VN, NbN, HfN, ZrN    Borides: Cu3B2, CrB2, Cr2B, CeB6, DyB6, GdB6, LaB6, ReB2, TiB2, TaB2, MoB2, VB2, HfB2, Mo2B5, NiB, NbB, W2B5, W2B,, WB, ZrB2.     Carbide: BC, B4C, CrC, Cr3C2, CoC, SiC, TiC, Ti2C, Ti3SiC2, TaC, VC, NbC, Ni3C2, Mo2C, HfC, WC, ZrC    Antimonide: InSb, GaSb, GeSb     Selenide: InSe, In2Sb, Bi2Se, CdSe, PbSe, CdSe    Telluride: CdTe, PbTe, ZnTe, SbTe, Sb2Te3, BiTe, Bi2Te3, MnTe    Fluoride: MgF2, YF3, YbF3, AlF3, LiF, BaF    Other Compound: SnAs   Methods of production: Vacuum sinter, Vacuum hot press, Hot isostatic pressing (HIP), Cold isostatic pressing (CIP), Spraying, Pressure casting process     Machinery: Hot-press equipment, Hot/Cold rolling equipment, Hot/Cold isostatic pressing equipment, vacuum casting equipment, forging equipment, Surface grinding machine, Precision turning machine