Pure 99.999% Graphite C Sputtering Target with Best Price

Product Details
Type: Metal Target
Shape: Square
Certification: TUV, ISO, CE
Manufacturer/Factory, Trading Company
Gold Member Since 2018

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Plant Area
101~500 square meters
Management System Certification
ISO 9001, ISO 14001, QHSE
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Basic Info.

Model NO.
3
The Date of Delivery
10days
Transport Package
Vacuum Packed in Wooden Case
Specification
customization
Origin
China
Production Capacity
500 Tons

Product Description

1. Grade: High Pure 99.999% Graphite carbon C sputtering target
2. Size: As request
3. Certification: ISO9001, SGS, The third party Certification
Product Name
Graphite carbon C sputtering target
Material
Carbon
Shape
Round/square,as you request
Purity
99.999%
Melting point
3500ºC
Boiling point
4827ºC
Technics
Powder Metallurgy
Used
Magnetic Data Storage, Semiconductor Application

Application

Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc. 

Pictures of Csputtering target


 



 

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