Sputtering Target: Titanium Sputtering / Arc Target with Different Materials

• Type: Sputtering Target Titanium
• Application: Vacuum Coating
• Technique: Forged
• Model NO.: Square, Round, Rotary, particle, silk, Customized
• Grade: GR2
• Shape: Square, Round, Rotary,Particle, Silk ,Customized
• Transport Package: Wooden Case
• Specification: According drawing
• Trademark: szzzyj
• Origin: China
• Production Capacity: 10000000

Product Description

Product Description

Products attributes of Ti sputtering target
 

Name	Metal Titanium Sputtering Target (Ti Target)
Material	Titanium Metal Materials
Purity	99.9%-99.995%, 3N,3N5,4N,4N5
Size	D50.8x3mm, 2inch,3inch,Or As Request
Color	Metallic Color
Shape	Planar/Round/Plate/Rotary/Bar , As Request.
Surface	Polished Surface
Ti Density	4.54g/cm3
Ti Melting Point	1668°C
Application	PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item	Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note	Support customize size,shape,purity,different alloy proportion etc. Contact us firstly (Price is based on size and purity)

Item Name	High purity titanium (Ti) target
Purity	99.9%~99.999%,Grade1 to Grade 5
Shape	Square/Round, According to your request
Available size	Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available
Certificates	ISO9001:2008, SGS, The third test report
Technics	Vacuum Melting, Patented thermo-mechanical process
Application	Widely used in coating processing industries A: Solar Photovoltaic Application. B: Electronic and Semiconductor Application. C: Decoration and Coating Application. etc.

 

Quality Standard (99.999% Ti)
Element	Value(<ppm)	Element	Value (<ppm)	Element	Value(<ppm)
Ag	0.05	Al	0.11	As	0.03
Au	0.05	B	0.01	Ba	0.005
Be	0.005	Bi	0.01	Br	0.05
Ca	0.2	Cd	0.05	Ce	0.005
Hg	0.1	Fe	3.2	Ga	0.05
I	0.01	Ge	0.05	Hf	0.01

The following table is a component analysis certificate for  5N Ti sputtering target. The analytical methods used are: 
1. Analysis of metal elements using GDMS or ICP-OES; 
2. Gas element analysis using LECO.
 

Elements	Actual	Spec	Units	Elements	Actual	Spec	Units	Elements	Actual	Spec	Units
Li	<0.005		ppm	Zn	<0.02		ppm	Pr	<0.005		ppm
B	<0.01		ppm	Ga	<0.05		ppm	Nd	<0.005		ppm
F	<0.05		ppm	Br	<0.05		ppm	Sm	<0.005		ppm
Na	<0.01		ppm	As	<0.05		ppm	Eu	<0.005		ppm
Mg	<0.01		ppm	Se	<0.05		ppm	Ru	<0.01		ppm
Al	0.59		ppm	Zr	0.34		ppm	Rh	<0.05		ppm
Si	0.16		ppm	Nb	<0.2		ppm	Gd	<0.005		ppm
P	<0.01		ppm	Mo	<0.05		ppm	Tb	<0.005		ppm
Cl	0.05		ppm	Pd	<0.01		ppm	Cd	<0.05		ppm
K	<0.01		ppm	Ag	<0.02		ppm	Be	<0.005		ppm
Ca	<0.5		ppm	Sn	<0.05		ppm	Sc	<0.05		ppm
Ti	Matrix		wt%	Sb	<0.05		ppm	Rb	<5		ppm
V	0.03		ppm	Ba	<0.005		ppm	Yb	<0.005		ppm
Ta	source		ppm	Dy	<0.005		ppm	Lu	<0.005		ppm
W	<0.01		ppm	Ho	<0.005		ppm	Au	<0.05		ppm
Pt	<0.05		ppm	Bi	<0.01		ppm	Hg	<0.1		ppm
Ti	<0.01		ppm	Th	<0.0001		ppm	Hf	<0.01		ppm
Pb	<0.01		ppm	U	<0.0001		ppm	Ir	<0.01		ppm
Re	<0.01		ppm	Er	<0.005		ppm	Ce	<0.005		ppm
Os	<0.01		ppm	Tm	<0.005		ppm	C	<5		ppm
Cr	0.73		ppm	In	<0.05		ppm	S	0.45		ppm
Mn	1		ppm	Te	<0.05		ppm	O	270		ppm
Fe	7.7		ppm	I	<0.05		ppm	N	5		ppm
Co	<0.005		ppm	Cs	<0.01		ppm	H	<1		ppm
Ni	0.05		ppm	La	<0.005		ppm
Cu	0.58		ppm	Ge	<0.005		ppm

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