Titanium Nitride Tin Ceramic Target

Product Details
Type: Ceramic Target
Shape: Rings, Wafers, Particles, Rod, Customization
Certification: TUV, ISO, CE
Manufacturer/Factory, Trading Company
Gold Member Since 2018

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Plant Area
101~500 square meters
Management System Certification
ISO 9001, ISO 14001, QHSE
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Basic Info.

Model NO.
3
Transport Package
Vacuum Wooden Box
Specification
Rings, wafers, particles, rod
Origin
China
Production Capacity
500 Tons/Year

Product Description

1. Name: 99.9% Purity Titanium Nitride(TiN) Sputtering Target Ceramic Target
2. Size: 1-8inch, customized
3. Purity: 99.9% 
4. Certification: ISO9001, SGS, CTI, ROHS

Product Name 99.9% Purity Titanium Nitride(TiN) Sputtering Target Ceramic Target
Material Titanium Nitride
Color Brown
Size 1-8inch, as request
Purity 99.9%
Keyword Titanium Nitride Sputtering Target
Technics Powder metallurgy
Used Semiconductor, PVD, CVD.

Size: Dia 2" x 3~6mm th ,Dia 3" x 3~6mm th ,according to customer's requirements 


Product display

 

Quality Standard (99.9)

Element

Valu(<Ppm)

Element

Valu(<Ppm)

Element

Valu(<Ppm)

Al

25

Mg

2

Si

25

B

0.5

Mn

20

Ta

1

Bi

1

Mo

10

Ti

20

C

20

N

5

U

2

Cd

2.5

Nb

50

W

20

Cr

30

Ni

25

Zr

0.1

Co

5

O

50

 

 

Fe

95

P

10

 

 

 

Product

Sign

Purity

Form

Spec

High purity TiN

 szzzyj.en.made-in-china.com

 

3N5, 4N

Sputtering targets

50.8*5mm etc

3N5, 4N

Rod

Dia2*5mm

3N5, 4N

Wire

Dia0.1-Dia5mm

3N5, 4N

Sheet

0.03-10mm thickness

3N5, 4N

Granules

1-5mm

3N5, 4N

Powder

-200mesh etc  

Producing high density and high purity Ceramic sputtering targets for research with custom sizes and custom compositions is our advantage. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS) and Inductively Coupled Plasma (ICP).

 

Below is a list we offer which is not exhaustive but just a sample - if you do not see something particular please contact us to request a quote directly.
 
Formula Oxide Target Purity Formula Ceramic Target Purity
Al2O3 Aluminium Oxide 2N-4N AlN Aluminum Nitride 4N
AZO Aluminum Zinc Oxide 4N B4C Boron Carbide 2N5
BaTiO3 Barium Titanate 4N Bi2Te3 Bismuth Telluride 4N
CeO2 Cerium Oxide 4N BN Boron Nitride 3N
CuO Copper Oxide 3N CIGS CuInGaSe 4N
Fe2O3 Ferric Oxide 3N-3N5 CIS CuInSe 4N
HfO2 Hafnium Oxide 4N Cu2S Cuprous Sulfide 4N 5N
In2O3 Indium Oxide 4N CZTS CuZnSnS 4N
MgO Magnesium Oxide 4N MgF2 Magnesium Fluoride 4N
MnO2 Manganese Dioxide 3N Si3N4 Silicon Nitride 3N
MoO3 Molybdenum Trioxide 4N SiC Silicon Carbide 3N
Nb2O5 Niobium Pentoxide 4N SnS2 Tin Disulfide 4N 5N
NiO Nickel Oxide 3N TiB2 Titanium Diboride 2N5
SiO2 Silicon Dioxide 4N 5N TiC Titanium Carbide 3N
SnO2 Tin Dioxide 4N TiN Titanium Nitride 3N
Ta2O5 Tantalum Pentoxide 4N YbF3 Ytterbium Fluoride 4N-5N
TiO2 Titanium Dioxide 4N YF3 Yttrium Fluoride 4N
V2O5 Vanadium Pentoxide 4N ZnS Zinc Sulfide 4N
WO3 Tungsten Trioxide 4N ZnSe Zinc Selenide 4N
ZnO Zinc Oxide 4N-5N ZnTe Zinc Telluride 4N
ZrO2 Zirconium Oxide 4N ZrB2 Zirconium Boride 3N
GZO Gallium Zinc Oxide 4N LiCoO2 Lithium Cobaltate 3N
ITO Indium Tin Oxide 4N SrRuO3 Strontium Ruthenate 3N
IZO Indium Zinc Oxide 4N SrTiO3 Strontium Titanate 3N

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes. 
Featured targets from Rhexon:
1.Pure Metal: 
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%), 
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%), 
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material



Certification report

Contact us

CENTRE METALLURGY TECH LTD
TEL:0086-755-27426325     +86-15014149381
 Website:http://szzzyj.en.made-in-china.com ,        https://szzzyj.en.made-in-china.com/
 
  

 

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