High Purity Yttrium Target / Y Sputtering Target Ring, Wafer, Particle Rod

• Type: Metal Target
• Shape: Rings, Wafers, Particles, Rod, Customization
• Certification: TUV, ISO, CE
• Transport Package: Vacuum Wooden Box
• Specification: Rings, wafers, particles, rod
• Origin: China
• Production Capacity: 500 Tons/Year

Product Description

Products attributes of yttriun target

Item Name	Factory price Yttrium sputterig target 5N
Purity	99.9%-99.999%
Shape	Square/Round, According to your request
Available size	Round: dia 25~300mm, Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available
Certificates	ISO9001:2008, SGS,The third test report
Technics	Vacuum Melting, Patented thermo-mechanical process
Application	Widely used in coating processing industries A: LCD Photoelectric Devices Application B: Electronic and Semiconductor Application. C: Decoration and Coating Application. etc.

Producing high density and high purity Ceramic sputtering targets for research with custom sizes and custom compositions is our advantage. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS) and Inductively Coupled Plasma (ICP).
Below is a list we offer which is not exhaustive but just a sample - if you do not see something particular please contact us to request a quote directly.
 

Formula	Oxide Target	Purity	Formula	Ceramic Target	Purity
Al2O3	Aluminium Oxide	2N-4N	AlN	Aluminum Nitride	4N
AZO	Aluminum Zinc Oxide	4N	B4C	Boron Carbide	2N5
BaTiO3	Barium Titanate	4N	Bi2Te3	Bismuth Telluride	4N
CeO2	Cerium Oxide	4N	BN	Boron Nitride	3N
CuO	Copper Oxide	3N	CIGS	CuInGaSe	4N
Fe2O3	Ferric Oxide	3N-3N5	CIS	CuInSe	4N
HfO2	Hafnium Oxide	4N	Cu2S	Cuprous Sulfide	4N 5N
In2O3	Indium Oxide	4N	CZTS	CuZnSnS	4N
MgO	Magnesium Oxide	4N	MgF2	Magnesium Fluoride	4N
MnO2	Manganese Dioxide	3N	Si3N4	Silicon Nitride	3N
MoO3	Molybdenum Trioxide	4N	SiC	Silicon Carbide	3N
Nb2O5	Niobium Pentoxide	4N	SnS2	Tin Disulfide	4N 5N
NiO	Nickel Oxide	3N	TiB2	Titanium Diboride	2N5
SiO2	Silicon Dioxide	4N 5N	TiC	Titanium Carbide	3N
SnO2	Tin Dioxide	4N	TiN	Titanium Nitride	3N
Ta2O5	Tantalum Pentoxide	4N	YbF3	Ytterbium Fluoride	4N-5N
TiO2	Titanium Dioxide	4N	YF3	Yttrium Fluoride	4N
V2O5	Vanadium Pentoxide	4N	ZnS	Zinc Sulfide	4N
WO3	Tungsten Trioxide	4N	ZnSe	Zinc Selenide	4N
ZnO	Zinc Oxide	4N-5N	ZnTe	Zinc Telluride	4N
ZrO2	Zirconium Oxide	4N	ZrB2	Zirconium Boride	3N
GZO	Gallium Zinc Oxide	4N	LiCoO2	Lithium Cobaltate	3N
ITO	Indium Tin Oxide	4N	SrRuO3	Strontium Ruthenate	3N
IZO	Indium Zinc Oxide	4N	SrTiO3	Strontium Titanate	3N

Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes. 
Featured targets from Rhexon:
1.Pure Metal: 
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%), 
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%), 
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material

Certification report

Contact us
CENTRE METALLURGY TECH LTD
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Website:http://szzzyj.en.made-in-china.com ,        https://szzzyj.en.made-in-china.com/