High Pure 99.999% Graphite Carbon C Sputtering Target

• Type: Metal Target
• Shape: Square
• Certification: TUV, ISO, CE
• Model NO.: 4
• The Date of Delivery: 10days
• Transport Package: Vacuum Packed in Wooden Case
• Specification: customization
• Origin: China
• Production Capacity: 500 Tons

Product Description

1. Grade: High Pure 99.999% Graphite carbon C sputtering target
2. Size: As request
3. Certification: ISO9001, SGS, The third party Certification

Product Name	Graphite carbon C sputtering target
Material	Carbon
Shape	Round/square,as you request
Purity	99.999%
Melting point	3500ºC
Boiling point	4827ºC
Technics	Powder Metallurgy
Used	Magnetic Data Storage, Semiconductor Application

Application

Widely used in coating processing industries A: Solar Photovoltaic Application. B: Electronic and Semiconductor Application. C: Decoration and Coating Application. etc.

Pictures of Csputtering target