Guangdong, China
Business Type:
Manufacturer/Factory
Plant Area:
101~500 square meters
Management System Certification:
ISO 9001, ISO 14001, QHSE
Main Markets:
North America, Eastern Europe, Southeast Asia, Western Europe
Average Lead Time:
Peak season lead time: 6-12 months
Off season lead time: one month
Sample Available

Titanium Aluminum Silicon Alloy Target, Tialsi Alloy Target, Titanium Aluminum Silicon manufacturer / supplier in China, offering 4n Purity PVD Coating Tialsi Alloy Sputtering Target30: 60: 10at%, PVD Coating Materials Chromium Cathode Arc Target Chromium Target, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum and so on.

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Supplier Homepage Products Alloy targets TiAlSi alloy target 4n Purity PVD Coating Tialsi Alloy Sputtering Target30: 60: 10at%

4n Purity PVD Coating Tialsi Alloy Sputtering Target30: 60: 10at%

Get Latest Price
Purchase Qty. / Reference FOB Price
1-4 Pieces US $50
5+ Pieces US $40
Port: Hong Kong, Hong Kong
Production Capacity: 200 Tons / Year
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram
Product Type: Sheet
Material: Tialsi
Carbon Content: Low Carbon
PCD: 100mm
ET: 45mm
Hole: 8

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Basic Info

Model NO.
1
Composition
30ti:60al:Si10 at%, or as Your Request
Transport Package
Wooden Box Vacuum
Specification
Drawing customization
Origin
China

Product Description

Titanium Aluminum Silicon Alloy pvd Targets/Titanium Sputtering Targets/TiAlSi alloy target for coating

 TiAlSi alloy target Proportion:
TI/Al/Si=30:60:10at%
Or according your requirment.
Molding industry: thermal isostatic pressure (HIP)

 TiAl alloy target Proportion:
TI/Al=80:20,70:30,67:33,,50:50at%,40:60andwt%
Al/Ti=80:20,70:30,67:33,50:50at%andwt%
Molding industry: thermal isostatic pressure (HIP)

Grade: TA1/Gr1,TA2/Gr2, TA3/GR3,TC4/Gr5 

Standard : ASTM B 381,GB/T 3620.1, GB/T 3620.2, GB/T 15073

Size: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T)

Or can be customized

Surface: bright

Titanium Aluminum is silver-white metal with similar appearance to steel. Widely used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
 
Product Name
Titanium Aluminum (TiAl) Sputtering Target
Purity
99.99%
Color
Grayish White, Lustrous, Metallic
Sputter
DC
Size
Tube/ Plate, Customized
Processing Method
Smelting and casting
Package
Vacuum coating
Service
Target Bonding with Indium

Chemical requirements

 

N

C

H

Fe

O

Al

V

Pa

Mo

Ni

Ti

Gr 1

0.03

0.08

0.015

0.20

0.18

/

/

/

/

/

bal

Gr 2

0.03

0.08

0.015

0.30

0.25

/

/

/

/

/

bal

Gr 3

0.05

0.08

0.015

0.30

0.35

/

/

/

/

/

bal

Gr 4

0.05

0.08

0.015

0.50

0.40

/

/

/

/

/

 

Gr 5

0.05

0.08

0.015

0.40

0.20

5.5~6.75

3.5~4.5

/

/

/

bal

Gr 7

0.03

0.08

0.015

0.30

0.25

/

/

0.12~0.25

/

/

bal

Gr 9

0.03

0.08

0.015

0.25

0.15

2.5~3.5

2.0~3.0

/

/

/

bal

Gr12

0.03

0.08

0.015

0.30

0.25

/

/

/

0.2~0.4

0.6~0.9

bal

4n Purity PVD Coating Tialsi Alloy Sputtering Target30: 60: 10at%
4n Purity PVD Coating Tialsi Alloy Sputtering Target30: 60: 10at%
4n Purity PVD Coating Tialsi Alloy Sputtering Target30: 60: 10at%



 

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