Guangdong, China
Business Type:
Manufacturer/Factory
Plant Area:
101~500 square meters
Management System Certification:
ISO 9001, ISO 14001, QHSE
Main Markets:
North America, Eastern Europe, Southeast Asia, Western Europe
Average Lead Time:
Peak season lead time: 6-12 months
Off season lead time: one month
Sample Available

In-Sn Alloy Target, Indium Ingot, Indium Sputtering Target manufacturer / supplier in China, offering High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum, 4n Pure Ta Tantalum Sputtering Target and so on.

Gold Member Since 2018
Audited Supplier
Supplier Homepage Products Metal Sputtering targets Indium & Tin target High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
  • High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
  • High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
  • High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
  • High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
  • High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
  • High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target

High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target

Get Latest Price
Purchase Qty. / Reference FOB Price
1-2 Pieces US $100
3+ Pieces US $90
Port: Hong Kong, Hong Kong
Production Capacity: 1000 Tons / Year
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram
Application: Aviation, Electronics, Industrial, Medical, PVD Ncvm
Standard: JIS, DIN, BS, ASTM
Purity: >99.99%
Grade: 6N (99.9999%)
Alloy: Non-alloy
Secondary: Non-secondary

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Basic Info

Model NO.
1
Transport Package
Vacuum Packing
Specification
Wafers, wires, ingots, rotary casting, pipes, gran
Origin
China

Product Introduction
1:Product:Indium Tin Alloy Sheet/Indium Tin Alloy Foil
2:Purity: 99.99%
3:Dimension:do as per client's require..

 

Popular Size: 0.05*100*100mm,0.1*100*100mm,0.15*100*100mm,0.2*100*100mm,0.25*100*100mm,

 

                      0.3*100*100mm,0.35*100*100mm,0.4*100*100mm,0.45*100*100mm,0.5*100*100mm,

 

                      200*200*0.05mm,200*200*0.1mm,120*120*0.1mm etc.
4:Color:Siliver Grey

5. Packing:as per customer's require…

6.Density:7.31g/cm3

7. Melting Point:156.76°C
8.Boiling Point:2073°C,

 

Grade

Impurities % max

In

Cu

Pb

Zn

Cd

Fe

Ti

Sn

As

Al

Total

99.995%

0.0005

0.0006

0.0004

0.0003

0.0003

0.0007

0.0005

0.0007

0.0008

0.0049

Basic information for  indium wire  99.999% and In-Sn alloy Wire (Proportional customization)

1.Purity:99.999% indium wire CAS 7440-74-6 with factory price

2.MOQ:1kg;

3.Main application:  Primarily used in fusible alloys, solders and flat panel display coatings

4.Diameter: 1.5mm,1mm,0.5mm,0.2mm,0.3mm,etc.

High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target



High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target

The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,

2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target  (80:20, 70:30,wt%),
5) Al/Cr alloy  target (70:30,50:50at%)
6) Nb/Zr alloy  target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr  target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi  alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi  alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
 

Authentication
 

High Purity 99.99% Indium Foil Indium Disc Indium Sputtering Target
 

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